Frontispiece: Synthesis of Thin‐Film Metal Pyrites by an Atomic Layer Deposition Approach

Atomic layer deposition: an overview.

Atomic Layer Deposition of Model Metal Oxide Electrode Architectures

A thorough knowledge of chemical and electrochemical processes that occur at the electrode interface is paramount to the development of improved materials for electrochemical energy storage. One approach is to study model systems with well-defined structures and geometries (architectures) more amenable to systematic and careful study of such materials. The goal of this work is to develop new ap...

Atomic Layer Deposition of Noble Metal Thin Films

3 Preface 4 List of publications 5 List of symbols and abbreviations 6

Metal-Insulator-Metal Single Electron Transistors with Tunnel Barriers Prepared by Atomic Layer Deposition

Single electron transistors are nanoscale electron devices that require thin, high-quality tunnel barriers to operate and have potential applications in sensing, metrology and beyond-CMOS computing schemes. Given that atomic layer deposition is used to form CMOS gate stacks with low trap densities and excellent thickness control, it is well-suited as a technique to form a variety of tunnel barr...

Atomic Layer Deposition of TiO

Additional resources and features associated with this article are available within the HTML version: • Supporting Information • Links to the 4 articles that cite this article, as of the time of this article download • Access to high resolution figures • Links to articles and content related to this article • Copyright permission to reproduce figures and/or text from this article High surface a...